+886.3.560.1777

Chinese

Mr. Barrett Finch

 

 

Mr. Barrett Finch

Director of Etch Product Marketing

Lam Research Corporation

 Education:

  • BSc in mechanical engineering, Texas Tech University.

 Experiences:

  • Mr. Finch has almost twenty years of  semiconductor industry experience dating to the 300 mm industry transition in 2000.  Mr. Finch has presented, published, and patented solutions for etch processing challenges ranging from multi-patterning, high-k dielectrics to atomic layer etching.  He has held senior management and engineering positions at both Lam Research and Applied Materials.

 Biography:

 

  • Barrett Finch is director of Etch Product Marketing at Lam Research Corporation. With industry experience dating to the 300 mm industry transition in 2000, Mr. Finch has presented, published, and patented semiconductor manufacturing technologies ranging from multi-patterning and high-k dielectrics to atomic layer etching. Prior to his current responsibilities, he held senior management and engineering positions at both Lam Research and Applied Materials. Mr. Finch earned a bachelor of science degree in mechanical engineering from Texas Tech University.

 

 Abstract:

 

  • As logic devices continue to scale, precise and repeatable etching is needed to achieve the required feature characteristics. Atomic layer etching (ALE) has long been predicted as a solution for critical plasma etch applications. Recently, the industry has seen the first production adoption of this technology for dielectric etching of self-aligned contacts (SAC). Given the complex and tight geometries involved, the SAC etch process is particularly challenging. Achieving the overall desired results involves optimizing three key tradeoffs: spacer corner loss due to poor etch selectivity, etch-block caused by polymerizing etch chemistries, and etched profile control. 

  • Dielectric ALE technology has demonstrated an unprecedented ability to both break these process tradeoff challenges and provide a manufacturing-compatible solution. An overview of ALE processing and its production-proven implementation to enable transistor scaling will be discussed along with potential future applications.

 

 

 

 

Share page with AddThis