Mr. Roderik van Es



Mr. Roderik van Es

Senior Marketing Manager

Business Line EUV



  • Master in Science Applied Physics


  • Product Manager EUV 2013-2017

  • Marketing Manager Korea 2008-2013

  • New Business Development 2004-2008

  • Equipment Engineer 2000-2004

  • MSc Delft University Applied Physics 1999



  • This presentation will provide an overview of the industrialization of EUV Lithography, including the latest data on imaging, overlay, defectivity and source power/ productivity. 

  • The focus of the presentation will be on the NXE:3400B scanner, ASML’s fifth generation EUV lithography tool intended for the sub 10 nm volume production.

  • Furthermore the ASML roadmap, NXE:3300B and NXE:3350B field data and field performance data will be shown.





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