Next-Generation Materials Design Enabled by Generative AI and Quantum Computing
Generative AI is transforming materials design by enabling inverse design approaches that directly generate molecular and material candidates with target properties. At the same time, quantum computing offers a promising route to describe the quantum-mechanical nature of materials more accurately than conventional methods for selected applications.
This presentation introduces Mitsubishi Chemical’s research activities on combining generative AI, quantum computing, and GPU-accelerated computing for next-generation materials design. We will discuss how quantum-derived molecular descriptors and quantum algorithms, including the Generative Quantum Eigensolver, can be integrated with generative models such as variational autoencoders to construct physically meaningful latent spaces for molecular design. Recent progress from collaborative research activities with NVIDIA on quantum-AI approaches for molecular and materials simulation will also be introduced.
As an example relevant to semiconductor manufacturing, we will highlight applications to EUV photoresist materials, where electron dynamics, photoemission, Auger processes, and multiscale simulations are critical for improving material performance. This integrated AI–quantum approach has the potential to accelerate the discovery and optimization of advanced semiconductor materials.
Key Technologies Covered
Generative AI for inverse materials design
Quantum computing for materials simulation
Generative Quantum Eigensolver
Quantum-derived molecular descriptors
Variational autoencoder-based molecular design
Quantum/classical hybrid computing
EUV photoresist materials design
Electron dynamics and Auger process simulation
Multiscale simulation for semiconductor materials
AI-driven materials discovery for advanced semiconductor applications